Scientists have developed a universal method for producing a wide variety of designed metallic and semiconductor 3D nanostructures — the potential base materials for next-generation semiconductor devices, neuromorphic computing, and advanced energy applications. The new method, which uses a ‘hacked’ form of DNA that instructs molecules to organize themselves into targeted 3D patterns, is the first of its kind to produce robust nanostructures from multiple material classes.
Scientists have developed a universal method for producing a wide variety of designed metallic and semiconductor 3D nanostructures — the potential base materials for next-generation semiconductor devices, neuromorphic computing, and advanced energy applications. The new method, which uses a ‘hacked’ form of DNA that instructs molecules to organize themselves into targeted 3D patterns, is the first of its kind to produce robust nanostructures from multiple material classes. Scientists have developed a universal method for producing a wide variety of designed metallic and semiconductor 3D nanostructures — the potential base materials for next-generation semiconductor devices, neuromorphic computing, and advanced energy applications. The new method, which uses a ‘hacked’ form of DNA that instructs molecules to organize themselves into targeted 3D patterns, is the first of its kind to produce robust nanostructures from multiple material classes.